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电感耦合等离子体原子发射光谱法测定钴基钎料中的硅含量

Determination of Si in Co-based filler metals by inductively coupled plasma atomic emission spectrometry
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摘要 选择钴基钎料硅元素中灵敏度高的光谱线作为分析线,研究了样品溶解方法,优化了仪器测定的工作条件。用电感耦合等离子体原子发射光谱法测定钴基钎料中硅元素含量。与标纲值对照,结果与标准值相符。用钴基钎料样品进行加入回收试验,回收率96%~107%,相对标准偏差小于4.29%。 A method for determination of Si element in Co-based filler metals by ICP-AES is proposed.The sensitive spectral lines of Si was selected as analytical lines.The sample dissolution method was studied,and the operational conditions were optimized.The Si contents in several Co-based filler metals were determined.The results were in agreement with standard values.The recoveries were 96%~107%,and the RSDs were less than 4.29%.
出处 《分析仪器》 CAS 2012年第1期39-41,共3页 Analytical Instrumentation
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