摘要
对即将动工的上海第三代同步辐射装置(SSRF)及其主要参数作了介绍。叙述了目前同步辐射x射线光刻和LIGA的一些技术进展情况。
Both the 3rd generation of shanghai synchrotron radiation facility(SSRF)which will be built soon and its main issues are introduced in this paper.Some progress of both synchrotron radiation x ray lithography and LIGA is introduced.The application prospect of SSRF lithography/LIGA station is analyzed briefly.
出处
《半导体技术》
CAS
CSCD
北大核心
2000年第1期11-13,共3页
Semiconductor Technology
关键词
同步辐射光源
X射线光刻
LIGA
The 3rd synchrotron radiation source X-ray lithography LIGA