美国西南研究院等离子全方位离子镀膜技术研究及实际应用

Plasma Immersion Ion Deposition Research at SwRI and Its Practical Applications

文中介绍了美国西南研究院(Southwest Research Institute-SwRI)等离子全方位离子镀膜技术(PI-ID)的最新研究成果。SwRI从实际应用出发,在等离子表面工程领域成功研发了一些新技术,PIID技术为其中一种。近几年来,SwRI研究的重点为类金刚石(DLC)涂层的高速率沉积,制备超厚DLC涂层用于提高工件的耐磨性和耐腐蚀性能、憎水DLC涂层以及长管道内表面的镀膜技术。与传统的脉冲辉光放电(PGD)技术不同,SwRI基于空心阴极放电(HCD)等离子技术研发了一套独特的镀膜技术,同时讨论了HCD技术的原理,并对HCD和PGD技术制备DLC涂层的实验结果和这两项技术的实际应用进行了讨论。最后,对该技术最新的研究方向进行了展望。

This paper reviews the latest research and development at Southwest Research Institute （SwRI） in Plasma Immersion Ion Deposition （PIID）. SwRI has been developing new technologies in plasma surface engi- neering for practical applications. One of the technologies is the PIID. In recent years, we have focused on high rate deposition of diamond-like carbon （DLC） coatings, thick DLC for improving erosion and corrosion resistance, hydrophobic DLC coatings, and the deposition of the inner surface of long pipes. A particular tech- nique is developed based on the hollow cathode discharge （HCD） plasma process rather than the conventionally used pulsed glow discharge （PGD） process. In this paper, we will discuss the principle of the HCD process, the experimental results of the DLC coatings produced by both the PGD and the HCD processes, and practical applications of these technologies. New research directions will be presented at the end of this paper.