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内生无铅复合钎料在不同工艺条件下的制备及性能研究 被引量:1

Preparation and properties study of lead-free in-situ composite solder under different conditions
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摘要 通过采用不同工艺的内生法在Sn-3.5Ag共晶钎料基体中引入弥散分布的Cu6Sn5颗粒,制得了内生无铅复合钎料。研究了不同工艺条件对该钎料力学性能及电迁移行为的影响。结果表明,在冷却速度(0.1℃/s)较慢时制备的钎料,其内生Cu6Sn5颗粒细小,分布最均匀,且团聚程度较轻,另外,其钎焊接头力学性能最好;通5 A电流384 h后,其正负极金属间化合物层厚度的差异保持在约1.2μm,说明Cu6Sn5颗粒的引入提高了钎料的抗电迁移性能。 Lead-free in-situ composite solders were prepared by introducing Cu6Sn5 grain reinforcements into the Sn-3.5Ag eutectic solder using in-situ methods with different processes. The effects of preparation condition on the mechanical and electromigration properties of the solder were studied. The results show that, for the solder prepared at a relatively low cooling rate (0.1 ℃/s), its endogenous Cu6Sn5 grains show small size, the most uniform distribution and less agglomeration, and its joint shows the best mechanical performance; After applying 5 A current for 384 h, the difference in the thickness of intermetallic compound between positive and negative poles of the solder keeps at about 1.2 μm, indicating that introduction of Cu6Sn5 reinforcements enhances the anti-electromigration ability of the solder.
出处 《电子元件与材料》 CAS CSCD 北大核心 2012年第3期57-60,共4页 Electronic Components And Materials
基金 教育部博士点学科专项科研基金资助项目(No.20101103110019) 国家自然科学基金面上资助项目(No.51071006)
关键词 内生无铅复合钎料 Cu6Sn5 可靠性 电迁移性能 lead-free in-situ composite solder Cu6Sn5 reliability electromigration property
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  • 1史耀武,雷永平,夏志东.SnAgCu系无铅钎料技术发展[J].新材料产业,2004(4):10-16. 被引量:10
  • 2闫焉服,刘建萍,史耀武,夏志东.银镍金属微细颗粒对锡铅基复合钎料力学性能的影响[J].稀有金属材料与工程,2005,34(4):622-626. 被引量:8
  • 3Chao B. Electromigration enhanced intermetallic growth and void formation in Pb-free solder joints [J]. J Appl Phys, 2006, 100: 084909, 1 -- 10.
  • 4Chae S H. Electromigration lifetime statistics for Pb-free solder joints with Cu and Ni UBM in plastic flip-chip packages [A]. 2006 Electronic Components and Technology Conference [C]. San Diego, CA, USA: IEEE, 2006. 650--656.
  • 5Chen C M. Effects of silver doping on electromigration of eutectic SnBi solder [J]. J Alloy Compd, 2007, in press.
  • 6Zhang X F. Abnormal polarity effect of electromigration on intermetallic compound formation in Sn-9Zn solder interconnects [J]. Scr Mat, 2007, 57: 513--516.
  • 7Ou S Q. A study of electromigration in Sn3.5Ag and Sn3.5Ag0.7Cu solder lines [A]. 2005 Electronic Components and Technology Conference [C]. Lake Buena Vista, FL, USA: IEEE, 2005. 1445-1450.
  • 8Xu L H. Combined thermal and electromigration exposure effect on SnAgCu BGA solder joint reliability [A], 2006 Electronic Components and Technology Conference [C]. San Diego, CA, USA: IEEE, 2006. 1154-- 1159.
  • 9Chiang K N. Current crowding-induced electromigration in SnAg3.0Cu0.5 microbumps [J]. Appl Phys Lett, 2006, 88: 580--582.
  • 10Zhang L. Current-induced weakening of Sn3.5Ag0.7Cu Pb-free solder joints [J]. Scr Mater,2007,56:381 --384.

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