摘要
用均苯四甲酸二酐(PMDA)与4,4'-二氨基二苯醚(ODA)为单体,以N,N-二甲基乙酰胺(DMAC)为溶剂,通过超声机械共混法制备聚酰亚胺/二氧化硅(PI/SiO2)复合薄膜,采用红外光谱(FTIR)、扫描电镜(SEM)分别对PI复合薄膜的结构和表面形貌进行了研究表征,通过concept 80宽带介电谱测试系统对复合薄膜电学性能进行了研究。结果表明:在一定的频率下,不同无机纳米粒子含量的复合薄膜中,介电常数和介电损耗角正切随无机纳米质量分数的增加而增大。
With pyromellitic dianhydride （PMDA） and 4,4＇-diaminodiphenyl ether （ODA） as monomers, N,N-dimethylacetamide（DMAC） as solvent, polyimide/nano-silica composition film was prepared by means of ultrasonic mechanical mixing method. The structure and surface morphology of PI composite film was examined and characterized by FTIR and SEM, and the electrical properties was also researched by use of concept 80 broadband dielectric spectroscopy test system. The results show that under the conditions of a certain frequency and composite film containing different content of inorganic nano-particles, the dielectric constant and the dielectric loss angle tangent improve with the increasing of content of inorganic nano-particles.
出处
《塑料科技》
CAS
北大核心
2012年第3期61-63,共3页
Plastics Science and Technology
关键词
聚酰亚胺薄膜
二氧化硅
超声机械共混
电学性能
Polyimide film
Silica
Ultrasonic mechanical mixing
Electrical properties
