真空等离子沉积中真空电弧的产生及触发电路的设计

Formation of Vacuum ARC in Vacuum Plasma Deposition and Design of Triggering Circuit

在真空等离子沉积中 ,首先要触发真空电弧 ,由于等离子沉积本身所具有的复杂性 ,要成功地触发真空电弧必须考虑很多因素 ,如 :阴极的材料、电极的结构、阴阳两电极之间的间隙、电极的表面状态、触发方式等。文中对影响触发电弧的因素以及在设计触发电路时需要考虑的因素作了一定的分析 ,并在此基础上 。

In the process of vacuum arc deposition, it is essential to trigger the vacuum gap. Although the deposition has been at present successful in triggering vacuum gap, it has also its speciality as to particular equipment. Due to its complexity in the process of vacuum gap triggering, many factors such as electrode material,structure, surface condition, distance between cathode and anode, background gases in deposition chamber,pulse triggering modes, etc. influence the successful ratio in the process of triggering vacuum gap. Combined with the particular equipment in the laboratory of Nanjing University of Aeronautics and Astronautics and on the basis of mechanical triggering mode,some factors must be considered and analyzed in designing deposition chamber and triggering circuit, and further a practical triggering circuit is proposed.