532nm激光作用下RDX的解离

Dissociation of RDX at 532nm Laser

采用飞行时间质谱仪(TOFMS)研究了532nm激光作用下RDX的解离过程,得到RDX解离过程中的正、负离子飞行时间质谱图。根据离解产物离子的可能分布,提出了RDX的3种解离途径。结果表明,N-N和C-N键断裂竞争反应呈现在532nm激光作用下RDX的解离过程中。

The dissociation process of hexahydro-l,3,5-trinitro-l,3,5-triazine（RDX） under 532 nm laser was studied by time of flight mass spectrometer（TOFMS）. The mass spectra of both positive and negative ions in the dissociation process of RDX were obtained. Three possible dissociation paths of RDX were proposed based on the possible ion distribution of the dissociation products. The results indicated that the competing reactions of cracking the N--N and C--N bond occurred in the dissociation of RDX when it was irradiated by 532 nm laser.