离子镀钛和氮化钛膜的结构与耐蚀性

CORRELATION OF STRUCTURE OF ION PLATED Ti AND TiN FILMS WITH ITS CORROSION RESISTANCE

离子镀技术作为物理气相沉积(PVD)表面改性的一种手段,由于其优良的工艺特性(如处理温度低、沉积速率高及适用范围广等)以及获得的镀膜具有良好的附着性、致密性和均布性而日益得到广泛的应用。如离子镀Ti膜等已作为耐特殊介质腐蚀保护层,离子镀Al_2O_3,SiO_2等镀膜对于抗高温腐蚀有良好效果,TiN涂层具有很好的耐蚀性,又是很好的表面耐磨强化层,也将得到应用。本工作DML-500A型离子镀膜机在抛光的A3钢和18-8(1Cr18Ni8)不锈钢基材上分别沉积Ti和TiN膜,采用室温下极化曲线测定法研究了镀膜工艺(主要是负偏压作用)以及添加微量稀土元素对镀膜结构和耐蚀性的影响。

Corrosion behavior of vapour plated titanium(VP-Ti), ion plated titanium(IP-Ti), titanium nitride(TiN), and yttrium-modified titanium nitride [Ti(Y) N] films has been studied in the corrosive media which contained 0.0N.0.1N, or 0.5N Cl-respectively. IP-Ti film exhibits better corrosion resistance than VP-Ti film, due probably to negative bias that enables the IP-Ti film to be more compact and more uniform, Pole figures of TiN and Ti(Y) N films show that there is a strong texture of TiN(110) for TiN film, and TiN(112) Tor Ti(Y)N film. The latter crystal plane is closer to TiN(1ll) with the highest degree of microcompactness, that may be responsible for the better corrosion resistance observed.