期刊文献+

二十一世纪微电子光刻技术与设备的发展对策研究

Strategic Study on the Development of Microelectronic Microfabrication Equipment and Technologies in 21st Century
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摘要 微电子 ,集成电路的水平是国家地位和综合国力的重要标志。集成电路集成度的增长离不开生产和制作集成电路的光刻设备。本文重点介绍集成电路的制造技术的制作设备的最新发展状况 ,提出发展我国微电子光刻技术的建议。 Level of microelectronics and IC is an important mark of national position and comprehensive power of a country.The increase of the integrity of IC depends on the development of advanced IC microfabrication equipment.The paper pays stress on the mostly current status of IC lithographic equipment research and development.Some suggestions are also given in the paper.
出处 《世界科技研究与发展》 CSCD 2000年第1期52-56,共5页 World Sci-Tech R&D
基金 中国科学院情报基金课题研究成果
关键词 微电子 光刻技术 集成电路 光刻设备 microelectronics, photo-lithography development trace, NGL, development suggestion, review
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参考文献8

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