反应磁控溅射制备AZO薄膜相结构的演化及机理研究

Evolution Mechanisim of Microstructure of AZO Thin Films Prepared by Reactive Magnetron Sputtering

在室温下,利用直流反应磁控溅射技术在不同的氧气流量下沉积ZnO∶Al(AZO)薄膜。采用XRD、SEM和TEM技术分析薄膜相成分、表面截面形貌及微观结构。结果表明:氧气流量为2.5 sccm时,沉积形成的薄膜为不透明具有金属导电性能的AZO/Zn(AZO)双层复合膜结构;氧气流量为3.5 sccm时,沉积形成了透明导电的AZO薄膜;氧气流量为5.0 sccm时,形成了透明不导电且含有纳米Al2O3颗粒的AZO薄膜;此外,AZO薄膜在400℃退火后,薄膜晶粒长大和(002)晶面方向择优生长更加明显以及高氧气流量沉积的AZO薄膜中的纳米Al2O3颗粒消失。

ZnO∶Al（AZO） thin films were grown by reactive DC magnetron sputtering technique under various oxygen flow ratio at room temperature.The effect of oxygen flow on phase,morphology and structure of the deposited films were systematically analyzed by XRD,SEM and TEM,respectively.The thin films deposited under 2.5 sccm O2 flows show AZO/Zn（AZO） bilayers structure.As the oxygen flow is 3.5 sccm,the AZO thin films with good visible transparency and low resistivity exhibited the c-axis（002） oriented polycrystalline films.As the oxygen flow is 5.0 sccm,Al2O3 nanoparticles were formed in AZO films with visible transparency and high resistivity and disappeared after annealing at 400 ℃.