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Si/Al/BN多层膜的制备及研究

Research on the deposition of Si/Al/BN multilayer
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摘要 本文采用磁控溅射系统制备了Si/Al/BN多层膜结构,并通过XRD,AFM,傅立叶红外光谱仪,纳米压痕仪等对Si/Al/BN多层膜结构进行了表征,表征结果表明本实验制备的Si/Al/BN多层膜基片符合高频声表面波器件基片的要求,为金刚石/IDT/BN多层膜超高频声表面波器件的制备奠定了基础. Si/Al/BN multilayer structure was deposited by magnetron sputtering system,and characterized by XRD,AFM,Fourier transform infrared spectroscopy,Nano-indenter.And the characterization show that the experimental preparation of Si/Al/ BN multilayer substrate meet the requirements of high-frequency surface acoustic wave device,and make a foundation for the preparation of diamond/IDT/BN multilayer ultra-high frequency SAW devices.
作者 曲长庆 孙连婕 陈希明 郭燕 吴小国
机构地区 天津理工大学电子信息工程学院天津市薄膜电子与通信器件重点实验室
出处 《天津理工大学学报》 2012年第1期76-78,88,共4页 Journal of Tianjin University of Technology
基金 国家自然科学基金(50972105 60806030) 天津市自然科学基金(09JCZDJC16500 08JCYBJC14600)
关键词 Si/Al/BN多层膜 高频声表面波 原子力显微镜 纳米压痕仪 Si/Al/BN multilayers high-frequency SAW AFM nano-indenter
分类号 O484.1 [理学—固体物理]
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参考文献10

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二级参考文献14

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天津理工大学学报
2012年 第1期

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