摘要
碳离子的能量是影响非晶金刚石薄膜结构和性质最关键的工艺参数.采用磁过滤真空溅射离子技术,研究不同衬底偏压Vb(即不同碳离子能量)下制备的非晶金刚石薄膜的拉曼光谱和表面形貌.结果表明:-50V≤Vb≤-10V时,样品表面均匀、光滑,拉曼谱是对称且很宽的散射带;Vb>-10V或Vb<-50V时,已有晶团出现,表面粗糙度明显增加,拉曼谱明显地分裂为1580cm-1的G带和1350cm-1的D带.
The ion energy is a crucial parameter for amnorphous diamond films deposition. Amorphous diamond films (a-D) were prepared by magnetic field filtered plasma stream system. TheRaman spectroscopy and surface morphology of a-D films deposited at various substrate bias volt-ages V_b were studied. The results show that a-D films, deposited at V_b in the range from -10Vto -50V, have a single and nearly symmetric very broad Raman peak range from 1200cm^-1 to1800cm^-1. The surface morphology of these films is very smooth and uniform. However, for samples deposited at V_b >-10V or V_b < -50V, the Raman spectra exhibit two broad peaks centeredapproximately at 1350cm^-1(D peak) and 1580cm^-1(G peak), and the surface roughness will beIncreases.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
2000年第1期179-182,共4页
Journal of Inorganic Materials