期刊文献+

太阳选择性吸收涂层的中温法向发射比测试对比

COMPARISON OF THE NORMAL THERMAL EMITTANCE MEASUREMENT OF SOLAR SELECTIVE COATING AT THE MIDDLE TEMPERATURES
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摘要 采用紫外-可见光-红外分光光度计、傅里叶红外光谱仪,在室温条件下,测量Mo-SiO2太阳选择性吸收涂层在空气300℃退火前后0.34~25.00μm波长范围内的近法向反射光谱曲线。假设室温和高温条件下光谱反射特性不变,根据基尔霍夫定律计算出涂层在不同温度下的法向发射比。采用辐射计法,测量同一片样品在200℃、300℃时的法向发射比,两种方法得出的数值差异仅为0.02~0.03。经误差分析发现,在保证涂层退火前后反射光谱曲线不变、工作温度不超过300℃的情况下,基于室温反射光谱曲线和中温辐射计法的结果在测试仪器的误差范围内基本等效。 The normal thermal emittance of Mo-SiO2 solar selective coating at 200℃ and 300℃ were measured by spectral reflectance and emission power, respectively. The near-normal reflectance in the wavelength region of 0.34-25μm of the as-deposited and annealed samples were measured with UV-VIS-NIR and FT-IR spectrometers at room temperature. The solar absorptance (α) and the normal thermal emittance (εn) at different temperature are calculated by Kirchhoff' s law on the hypothesis of the same spectral reflectance at different temperature, en at 200℃ and 300℃ were also measured by normal relative emission power meter. The difference of measured value was about 0.02-0.03, which showed the equivalence of spectral reflectance and emission power meter based on the error analysis.
出处 《太阳能学报》 EI CAS CSCD 北大核心 2012年第3期409-413,共5页 Acta Energiae Solaris Sinica
基金 国家自然科学基金(61176059) 国家高技术研究发展(863)计划(2012AA050601) 清华大学自主科研计划(20100208111)
关键词 太阳选择性吸收涂层 法向发射比 反射光谱 辐射计法 solar selective coating normal emittance spectral reflectance emission power meter
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参考文献14

  • 1殷志强;徐晟;史月艳.渐变Al-N/Al太阳选择性吸收表面[J]真空科学与技术,1988(03):141-150.
  • 2吴家庆,殷志强,王德晓.真空集热管中吸收涂层的半球向发射率的确定[J].太阳能学报,1989,10(2):208-214. 被引量:3
  • 3Lanxner Michael,Elgat Zvi. Solar selective absorber coating for high service temperatures,produced by plasma sputtering[J].Proceedings of SPIE-The International Society for Optical Engineering,1990.240-249.
  • 4Du Xinkang,Wang Cong,Wang Tianmin. Microstructure and spectral selectivity of Mo-Al2O3 solar selective absorbing coatings after annealing[J].Thin Solid Films,2008,(12):3971-3977.
  • 5Zhang Qichu. Recent progress in high-temperature solar selective coatings[J].Solar Energy Materials and Solar Cells,2000,(1-2):63-74.
  • 6Zhang Qichu. Stainless-steel-AlN cermet selective surfaces deposited by direct current magnetron sputtering technology[J].Solar Energy Materials and Solar Cells,1998,(1-2):95-106.
  • 7Zhang Qichu. Optimizing analysis of W-AlN cermet solar absorbing coatings[J].Journal of Physics D:AppliedPhysics,2001,(21):3113-3120.
  • 8Barshilia H C,Selvakumar N,Rajam K S. Deposition and characterization of TiAlN/TiAlON/Si3 N4 tandem absorbers prepared using reactive direct current magnetron sputtering[J].Thin Solid Films,2008,(18):6071-6078.
  • 9Visitsergntrakul S,Kirtikara K,Thavarungkul N. Pilot plant production of black chrome in Thailand:From science to technology[J].Solar Energy Materials,1990,(01):1-6.
  • 10费敬银,周爱梅,王宝珑.太阳光谱选择性低电流黑铬镀层研究[J].太阳能学报,1991,12(3):334-336. 被引量:4

二级参考文献4

  • 1吴家庆,清华大学学报,1982年,22卷,2期,89页
  • 2火石中,太阳能学报,1987年,8卷,3期
  • 3刘鉴民,太阳能学报,1985年,6卷,2期
  • 4高南,特种涂料,1984年,7期

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