摘要
提出了一种基于空间光调制器的并行光刻制备微透镜阵列的技术。采用数字微反射镜器件输入光刻图形,结合热回流技术,制作任意结构和排布的微透镜阵列。无限远校正显微微缩光学系统的长焦深保证了深纹光刻的实现,热回流法提供了良好的表面光滑度。与传统逐层并行光刻和掩模曝光技术相比,提出的技术方案更加便捷灵活,特别适合制作特征尺寸在数微米至百微米的微透镜阵列器件。得到的微透镜阵列模版经过电铸转移为金属模具,利用紫外卷对卷纳米压印技术在柔性基底上制备微透镜阵列器件,在超薄液晶显示、有机发光二极管(OLED)照明等领域有广泛应用。
An approach of fabrication of microlens arrays using spatial light modulator based lithography method is proposed.Combined with themal reflow method,digital micro-mirror device is used to pattern microstructure,and microlens arrays with arbitrary structure and topology can be obtained.The patterns on thick photoresist layer are projected by an infinity-corrected optical system.Good surface quality can be realized by thermal reflow method.Compared with classical stereolithography and mask-based exposure lithography method,the proposed method has the advantage of low-cost and high efficiency,especially suitable for fabricating microlens arrays which feature size ranging from several micrometers to hundreds of micrometers.The obtained microlens array can be transferred to a nickel mold by quasi-lithography electrodeposition and modeling（LIGA） process,which can be used as an imprinting mold.The flexible microlens array film can find wide application in novel ultra-thin liquid crystal displays,organic light-emitting diodes（OLED）,etc.
出处
《中国激光》
EI
CAS
CSCD
北大核心
2012年第3期244-248,共5页
Chinese Journal of Lasers
基金
国家自然科学基金(60907010)
江苏省高校自然科学研究重大项目(10KJA140048)资助课题
关键词
光学制造
微透镜阵列
光刻
空间光调制器
optical fabrication
microlens array
lithography
spatial light modulator
