水溶性超支化光敏有机硅聚氨脂丙烯酸酯低聚物的合成

Synthesis of water-soluble hyperbranched photosensitive polysiloxane urethane acrylate oligomers

以三羟甲基丙烷(TMP)和N,N-二羟乙基-3-胺基丙酸甲酯为单体,通过"准一步法"合成三代超支化聚胺-酯(HBP-OH),再与羟烷基硅油、异佛尔酮二异氰酸酯(IPDI)、二羟甲基丙酸(DMPA)和丙烯酸-β-羟乙酯(HEA)反应,合成了三代水溶性超支化光敏有机硅聚氨脂丙烯酸酯低聚物(WHBPSUA)。研究了反应温度、DMPA用量等因素对合成反应和产物性能的影响,确定了最佳反应条件,并通过IR、1H-NMR和GPC对超支化聚胺-酯及低聚物结构进行了表征。结果表明,三代超支化聚胺-酯(HBP-OH)最佳反应温度分别为120、130和135℃;DMPA和羟烷基硅油物质的量的比为1∶1时,所合成产物WHBPSUA具有良好的水溶性和成像性。

Hyperbranched poly （amine-ester） s （HBP-OH） have been synthesized using trimethylolpropane （TMP） and N, N-diethylol-3-amine methylpropionate as raw materials through the pseudo-one-step route. Then water-soluble hyperbranched photosensitive polysiloxane oligomers （WHBPSUA） were synthesized using HBP-OH, hydroxylterminated polydimethylsiloxane, isophorone diisocyanate （IPDI）, dimethylol propionic acid （DMPA） and 2hydroxyethyl acrylate （HEA） as raw materials. The structures of HBP-OH and WHBPSUA were characterized by FT-IR, H-NMR and gel permeation chromatography （GPC） . The influences of the reaction temperature and concentration of DMPA on the synthesis reaction and the properties of the oligomers were studied in detail. The opti- mum reaction temperatures for the synthesis of the first, second and third generations of HBP-OH were 120, 130 and 135 ℃, respectively. When the molar ratio of DMPA to polysiloxane was 1 to 1, the WHBPSUA oligomers had good water solubilities and imaging properties.