摘要
钼薄膜作为电极和布线材料在太阳能电池和薄膜晶体管的制造中具有重要应用价值。磁控溅射作为一种制备钼薄膜的主要手段,其溅射工艺对钼薄膜的性能有着重要的影响。本文通过改变溅射电流和时间制备了具有不同形貌的钼薄膜,并对其电学性能进行了比较,从而得到了较为适合的钼薄膜溅射工艺。
As the electrode and wiring material, molybdenum film has important application value in the production of solar cells and TFT - LCD. Magnetic sputtering is a major method to prepare molybdenum film and the sputtering parameter has great impact on the properties of molybdenum film. In this paper, molybdenum films with different morphologies are prepared under different sputtering current and time. By comparing the electronic properties of the films we acquire the suitable sputtering parameters for molybdenum film growth
出处
《中国钼业》
2012年第1期15-17,共3页
China Molybdenum Industry
关键词
钼薄膜
导电性
磁控溅射
溅射工艺
molybdenum film
electronic property
magnetic sputtering
sputtering parameter
