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斜入射电磁波在非均匀碰撞等离子体中的折射和反射特性 被引量:3

Refraction and reflection of obliquely incident electromagnetic wave by inhomogeneous collisional plasmas
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摘要 提出碰撞吸收型等离子体的等效折射指数,重新计算了折射角,并与利用常规方法得到的折射角进行了比较。分析了等离子体密度和碰撞频率对折射角的影响。考察了斜入射电磁波在吸收型等离子体中的折射特性,并以一维非均匀碰撞吸收型等离子体为例,对斜入射电磁波的反射特性进行了考察。结果表明,等效折射指数的概念涵盖了入射角度的影响,在考察斜入射时更准确、便捷。 The effective refractive indices of collisional plasma are proposed, which are adopted to calculate the refractive angles. The angles are compared with those using traditional Snell's theory and plasma complex refractive indexes. The dependences of discrepancies on plasma electron density and collision frequency are analyzed. The refraction and transporting properties of obliquely incident wave in inhomogeneous collisional plasmas are investigated. As an example, the reflection coefficients of obliquely incident wave by an inhomogeneous plasma slab are calculated and discussed. The results show that the influence of the incident angle is considered in the effective refractive indices of collisional plasma which are suitable to investigate the refraction and reflection of obliquely incident electromagnetic wave by inhomogeneous collisional plasmas.
出处 《核聚变与等离子体物理》 CAS CSCD 北大核心 2012年第1期32-37,共6页 Nuclear Fusion and Plasma Physics
基金 新世纪优秀人才支持计划(NCET) 安徽省红外与低温等离子体重点实验室基金资助课题(2010A001005D)
关键词 反射 斜入射 等效介电常数 等离子体 Electromagnetic refraction Obliquely incident wave Effective refractive index Plasma
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  • 1朱绪宝 陆红.等离子体隐身技术及其应用[J].隐身技术,1999,(2).
  • 2Vidmar R J. 1991, IEEE Trans Plasma Sci., 18:733
  • 3Kelly K L, Scharer J E, Ding G. 1999, Jounal of Applied Physics, 85:63
  • 4Itkawa Y. 1973, Phys. Fluid, 16:831
  • 5Zhang S, Hu X W. 2005, Chin. Phys. Lett., 22:168
  • 6Landau L D. 1946, J. Phys. USSR, 10:25
  • 7Chen Liu. 1987, Wave and Instabilities. Singapore: World Scientific Publications
  • 8Krall N A, Trivelpiece A W. 1973, Principles of Plasma Physics. New York: McGrawHill
  • 9Kruer W L. 1988, The Physics of Laser Plasma Interaction. Boulder Colorado: Westview Press
  • 10Hu X W, Liu M H. 2004, Plasma Sci. and Technol., 6: 2564

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