摘要
Zinc nitride films were prepared by RF magnetron sputtering a metallic zinc target in NH3-Ar mixture gases on glass substrate at room temperature. The effects of NH3 ratio on the structural and optical properties of the films were examined. X-ray diffraction （XRD） analysis indicates that the films are polycrystalline and have a preferred orientation of （321）. An indirect optical band gap increased from 2.33 to 2.70 eV when the NH3 ratio varied from 5% to 25%. The photoluminescence （PL） spectrum shows two emission peaks; the peak located at 437 nm is attributed to the incorporation of oxygen, and the other at 459 nm corresponds to the intrinsic emission.
Zinc nitride films were prepared by RF magnetron sputtering a metallic zinc target in NH3-Ar mixture gases on glass substrate at room temperature. The effects of NH3 ratio on the structural and optical properties of the films were examined. X-ray diffraction （XRD） analysis indicates that the films are polycrystalline and have a preferred orientation of （321）. An indirect optical band gap increased from 2.33 to 2.70 eV when the NH3 ratio varied from 5% to 25%. The photoluminescence （PL） spectrum shows two emission peaks; the peak located at 437 nm is attributed to the incorporation of oxygen, and the other at 459 nm corresponds to the intrinsic emission.
基金
Project supported by the National Natural Science Foundation of China(No.10974077)
the Natural Science Foundation of Shandong Province,China(No.2009ZRB01702)
the Shandong Province Higher Educational Science and Technology Program,China(No. J10LA08)
