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ESD protection design for the gate oxide of an RF-LDMOS

ESD protection design for the gate oxide of an RF-LDMOS
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摘要 This paper presents the investigation of integrated electrostatic discharge (ESD) protection design for the gate oxide of an RFLDMOS (radio frequency lateral double diffusion MOS). Through a comprehensive dis cussion of experimental and simulated results, a cascoded NMOS is presented as appropriate integrated gate oxide ESD protection with a high holding voltage and a flexible ESD design window. This paper presents the investigation of integrated electrostatic discharge (ESD) protection design for the gate oxide of an RFLDMOS (radio frequency lateral double diffusion MOS). Through a comprehensive dis cussion of experimental and simulated results, a cascoded NMOS is presented as appropriate integrated gate oxide ESD protection with a high holding voltage and a flexible ESD design window.
出处 《Journal of Semiconductors》 EI CAS CSCD 2012年第4期59-63,共5页 半导体学报(英文版)
关键词 cascoded NMOS ESD high voltage technology radio frequency lateral double diffusion MOS BVengineering implant cascoded NMOS ESD high voltage technology radio frequency lateral double diffusion MOS BVengineering implant
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参考文献8

  • 1Cao G J,Manhas S K,Narayana E M S. Comparative study of drift region designs in RF LDMOSFETs[J].IEEE Transactions on Electron Devices,2004,(08):1296.doi:10.1109/TED.2004.832703.
  • 2De Souza M M,Fioravanti P,Cao G. Design for reliability:the RF power LDMOSFET[J].IEEE Transactions on Device and Materials Reliability,2007,(01):162.doi:10.1109/TDMR.2006.889265.
  • 3Voldman S H. Latchup[M].John Wiley and Sons,Inc,2007.
  • 4Keppens B,Mergens M P J,Trinh C S. ESD protection solutions for high voltage technologies[A].2004.
  • 5Amerasekera E A,Duvvury C. ESD in silicon integrated circuits[M].West Sussex,John Wiley and Sons,Ltd,2002.
  • 6Sze S M. Physics of semiconductor devices[M].New York:John Wiley and Sons,Inc,1981.
  • 7Fong Y,Hu C. High-current snapback characteristic of MOSFET's[J].IEEE Transactions on Electron Devices,1990,(09):2101.doi:10.1109/16.57176.
  • 8Kim H T,Choi J B,Lee J U. Extraction of source and drain resistances in MOSFETs using parasitic bipolar junction transistor[J].Electronics Letters,2005,(13):772.doi:10.1049/el:20051108.

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