抛光金刚石膜残余应力对红外透射性能的影响

Influence of Residual Stress of Mechanical Polishing CVD Diamond Film on IR Transmittance

以抛光的CVD金刚石厚膜为基体,用X射线衍射测出其光谱,再运用布拉格公式计算出表面的残余应力,测出一定应力状态下对应红外透射率的大小,探讨CVD金刚石厚膜的内应力和红外透射率之间的作用规律。研究结果表明:抛光的CVD金刚石厚膜由于竞争生长模式下的粗大柱状晶和非金刚石成分的掺杂,使得内应力变化较大,随着膜中残余应力的增大CVD金刚石膜红外透射率将减小。

The X diffractive spectrum of polishing CVD diamond thick film is tested by X diffractive method.Then its residual stress is computed using the Prague formula,and the value of the IR transmittance which corresponds with the stress state is measured.Then the rule between the internal stress and the infrared transmittance is discussed.Experiment results indicate that： as the polishing CVD diamond thick film growth at the mode of competition,the columnar crystals are very large and mix with non-diamond components,this makes the internal stress of the film largely change.With the increase of the residual stress,the IR transmittance of CVD diamond film decreases.