期刊文献+

脉冲N离子束轰击对TiAlN膜层和W18Cr4V高速钢结合力的影响 被引量:3

Effect of Nitrogen Ion Beam Bombardment on Adhesion of Ion Plated TiAlN Coating to W18Cr4V High-Speed Steel
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摘要 用电弧离子镀在刀具表面制备TiAlN膜层有利于提高其硬度和耐磨性能,但却降低了膜基结合力,影响其使用寿命。采用UVN 0.5D2I脉冲离子束辅助电弧离子镀沉积设备,在W18Cr4V高速钢基材上沉积TiAlN膜层。研究了基材N离子束轰击及在膜层沉积过程中N离子束辅助轰击对TiAlN膜层结合力的影响。结果表明:膜层沉积之前,N离子轰击与基材原子发生了相互作用,造成了原子级洁净的表面,形成了大量的高密度形核点,且形成了含有N元素的改性层;在膜层沉积初期,脉冲N离子束轰击形成了由W,Cr,V,Fe,N,Ti,Al元素组成的具有一定厚度的"扩散层",其与"改性层"的共同作用是膜基结合力提高的主要原因,膜基结合力最高为80 N。 A pulse ion beam-assisted arc-ion plating facility was performed to deposit TiAlN coatings on W18Cr4V high-speed steel substrate.The effects of nitrogen ion beam bombardment of substrate before coating deposition and nitrogen ion beam auxiliary bombardment during coating deposition on the adhesion of the ion plated TiAlN coatings to the steel substrate were investigated.It was found that,before coating deposition,nitrogen ion beam bombardment of substrate allowed interaction between the nitrogen ion beam and substrate atom,generating clean surface of atomic level as well as a large amount of high-density nucleation points and N-containing modified layer.In the early stage of coating deposition,pulse nitrogen ion beam bombardment resulted in a diffusion layer composed of W,Cr,V,Fe,N,Ti and Al with a certain thickness.The diffusion layer acted together with the modified layer to increase the adhesion of the ion plated coating to the steel substrate,and the maximum adhesion was as much as 80 N.
出处 《材料保护》 CAS CSCD 北大核心 2012年第4期18-20,73,共3页 Materials Protection
基金 科技部国际合作重点项目(2009DFA4800)
关键词 电弧离子镀 W18CR4V高速钢 N离子束轰击 TiAlN膜层 结合力 arc-ion plating W18Cr4V high-speed steel nitrogen ion beam bombardment TiAlN coating adhesion
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参考文献13

  • 1Tai C N,Koh E S,Akari K. Macroparticles on TiN films prepared by the arc ion plating process[J].Surface and Coatings Technology,1990.324-320.
  • 2Lindfors P A,Mularie W M,Wehner G K. Cathodic arc deposition technology[J].Surface and Coatings Technology,1986.275-282.
  • 3Matthews A,Lefkow A R. Problems in the physical vapour deposition of titanium nitride[J].Thin Solid Films,1985.283-286.
  • 4Erturk E,Heuvel H J. Adhesion and structure of TiN arc coatings[J].Thin Solid Films,1987.135-140.
  • 5波特GJM;福蒂DC;胡壮麒;江晓平 赵奇.表面改性与合金化(激光束、离子束、电子柬技术)[M]北京:科学出版社,198856-63.
  • 6Charles W,Tucker J R,Senio P. On the nature of thermal spikes[J].Journal of Applied Physics,1956,(03):207-209.
  • 7Davis H A,Stinnen R W,Yatsui K. Intense Ion-Beam Treatment of Materials[J].MRS Bulletin,1996,(04):155-158.
  • 8张通和.离子柬表面工程技术与应用[M]北京:机械工业出版社,20054-5.
  • 9江兴流,韩丽君,禹日成.纳秒强脉冲粒子束与纳米科技[J].高电压技术,1996,22(2):74-75. 被引量:2
  • 10张通和.离子束材料改性科学和应用[M]北京:科学出版社,199947-48.

二级参考文献12

  • 1宋贵宏,郑静地,刘越,孙超.TiAl过渡层对电弧离子镀沉积TiAlN膜层的影响[J].人工晶体学报,2004,33(3):422-427. 被引量:9
  • 2Rickerby D S , Bull S J, Robertsson T, et al. The role of titanium in the abrasive wear resistance of physically vapour - deposited TiN [ J ]. Surf Coat Technol, 1990,41 : 63.
  • 3Sundgren J E, Hentzen H T G. A review of the present state of art in hard coatings grown from the vapor phase [J ]. J Vac Sci Technol, 1986:2259.
  • 4Chen Y I, DuhJ G. TiN coatings on mild steel substrates with electroless nickel as an interlayer[J ]. Surf Coat Technol , 1991, 48:163.
  • 5Klutha O, Recha B, Houben L, et al. Texture etched ZnO: Al coated glass substrates for silicon based thin film solar cells [J]. Thin Solid Films,1999,351:247.
  • 6Larsson M, Bromark M, Hedengvist P, et al. Deposition and mechanical properties of multilayered PVD Ti - TiN coatings [J]. Surf Coat Technol, 1995,76:202.
  • 7Pan W L, Yu G P, Huang J H. Mechanical properties of ion -plated TiN films on AISI D2 steel[J]. Surf Coat Technol, 1998,110:111.
  • 8徐信夫,翟乐恒,张建华.在空心阴极离子镀膜机中进行的离子渗氮的探索[M].北京:工业出版社,1992:12.
  • 9郭铮匀.钢的氮化[M].北京:国防工业出版社,1979.
  • 10夏立芳 高彩桥.钢的渗氮[M].北京:机械工业出版社,1989..

共引文献5

同被引文献26

  • 1楚书君,王志刚.W18Cr4V钢刨齿刀裂纹失效分析[J].金属热处理,2007,32(z1):322-324. 被引量:1
  • 2佗劲红,陈岁元,周利,刘常升,李慧利.激光表面改性对轧辊用高速钢组织与硬度的影响[J].金属热处理,2006,31(1):56-59. 被引量:15
  • 3Stosic P. Comparative tests of TiNand ( Ti0. 5 A10. 5 ) N coated hobs in gear cutting operations [ J ]. Vacuum, 1989,39(6) :557 -561.
  • 4Munz W D. Titanium aluminum nitride films:Anew al- ter-native to TiN coatings[J].J Vac Sci. Technol, 1986,A4(6) :2717 -2721.
  • 5Freller H, Gunther K G. Low Temperature Vapour Phase Coating Processes for Wear Resistant Coating son High Duty Tools[ J ]. Annals of the CIRP, 1987,36 ( 1 ) :99 - 104.
  • 6Tai. CN, Koh E S, Akari K. Macroparticles on TiN films prepared by the arc ion plating process[ J]. Surf. Coat. Technol, 1990,43 ( 1 ) :324 - 335.
  • 7Lindfors P A, Mularie W M, Wehner G. K, Cathodic arc deposition technology [ J ]. Surf. Coat. Technol, 1986,29( 1 ) :275 - 290.
  • 8Jehn H A, Hofmann S, Ruckbotrn V E, et al. Morphol- ogy and properties of sputtered(TiAl) N layers on high speed substrates as a function of deposition temperature and sputtering atmosphere [ J ]. J Vac Sci Tehnol , 1986,14( 1 ) :2701 -2705.
  • 9Inoue S, Uchida H,Hioki A,et al. Structure and com- position of (TiA1)N films prepared by r. f. planar magnetron sputtering using a composite target [ J ], Thin Solid Films, 1995,271 ( 1 ) : 15 - 18.
  • 10Coll B F, Fontana R, Gates A, et al. (TiA1)N ad- vanced films prepared by arc process [ J ]. Materials Science and id Engineering, 1991,140( 1 ) :816 - 824.

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