摘要
介绍了助剂硅的两种不同加入方式和不同加入量的MoNiP催化剂,并对其进行N2物理吸附、拉曼光谱和H2-TPR表征。结果表明:不同量的助剂硅使MoNiP催化剂的H2-TPR还原峰不同程度的后移,但同时还原峰的峰面积增加。不同量硅的加入,使MoNiP催化剂中八面体配位的钼不同程度的增多。八面体配位的钼越多,催化剂的起始还原温度越低。
Silicon with different addition amount was doped into MoNiP catalyst by different addition ways,and the catalyst was characterized by N2 physical absorption,Raman and H2 –TPR.The results indicate that after doping silicon into MoNiP catalyst,H2 –TPR reduction peak moves backward in different degree,and peak area increases;With increasing of silicon addition amount,octagonal coordinated molybdenum in MoNiP catalyst increases in different degrees.The more octagonal coordinated molybdenum content in the MoNiP catalyst,the lower initial reduction temperature of the catalyst.
出处
《当代化工》
CAS
2012年第3期236-238,330,共4页
Contemporary Chemical Industry
关键词
成胶
二氧化硅
加氢
催化剂
Gelling
Silicon dioxide
Hydrogenation
Catalyst
