一种自交联聚合物的合成及其在水显影化学增幅型负性抗蚀剂中的应用

SYNTHESIS OF A SELF-CROSSLINKING POLYMER AND ITS APPLICATION IN WATER-DEVELOPABLE,CHEMICALLY AMPLIFIED NEGATIVE PHOTORESIST

本文引入单体MAGME合成了具有自交联作用的MAGME、苯乙烯和N ( 4 羟基苯基 )马来酰亚胺的共聚物 ,并以该聚合物为基体树脂 ,研制了一种新型的水显影化学增幅型负性抗蚀剂 ,并初步研究了其光刻工艺条件 .

A new kind of acid-sensitive polymer with T_g=95℃ and M_n=7*!625, M_w=25*!013 (M_w/M_n=3.28) was synthesized by the co-polymerization of styrene, N-(4-hydroxyphenyl) maleimide and methylacrylamidoglycolate methylether(MAGME). This MAGME containing co-polymer can be self-crosslinked via acid-catalyzed condensation reaction when heated. A new kind of chemically amplified negative photoresist without crosslinking agent was studied using this co-polymer as the base resin, which was developable in harmless NaOH-H_2O solution. Diaryliodonium hexafluorophosphate was used in the photoresist as the photo-acid generator to supply the strong acid and phenothiazine was the photosensitizer. The condition of photolithography was preliminarily investigated.\;