双层辉光离子渗金属技术沉积氮化钛薄膜的微观结构研究

Microstruture of Titanium Nitride Films Prepared by Double-Glow Discharge Plasma Surface Alloying Technique

采用双层辉光离子渗金属技术,在硬质合金基体表面上制备了氮化钛(TiN)薄膜,通过微观结构和显微硬度分析,研究了基体温度对TiN薄膜性能的影响.实验结果表明:所有TiN样品均具有面心立方结构,并且薄膜生长的择优取向、晶粒尺寸、晶面间距、晶格常数和微观硬度等都与基体温度密切相关.当基体温度为650～780℃时,TiN薄膜具有最小的晶粒尺寸(26.9 nm)和最大的显微硬度(2204 HV).

Titanium nitride（TiN） films were directly deposited on the surface of hard alloy tools（YG8） using the double-glow discharge plasma surface alloying technique.The influence of substrate temperature on the microstructural and mechanical properties of TiN films was investigated by X-ray diffraction（XRD） and microhardness test.Experimental results demonstrate that the prepared TiN films are all the face-centered cubic（fcc） structure,and that the substrate temperature significantly affects the preferred orientation,crystallite size,plane spacing,lattice constant and microhardness of the films.The TiN film deposited at substrate temperature of 650~780 ℃ has the maximum microhardness of 2204 HV and the minimum crystallite size of 26.9 nm.