基于原子力显微镜的纳米抛光颗粒的摩擦力测量方法

Measurement of Interfacial Friction Force of Nanoparticles by Atomic Force Microscope

基于原子力显微镜接触模式,使用侧向力扫描测量单个纳米颗粒与基底表面的摩擦力,从而为颗粒从基底表面去除提供最为直接的测试方法。对硅片表面进行羟基化增强其亲水性,将聚苯乙烯纳米颗粒单层均匀地分散到硅片上。使用横向力模式和NanoMan两种方法侧向推动纳米颗粒,测得单个颗粒与硅片表面之间的最大静摩擦力分别为(1.57±0.09)μN和(1.51±0.13)μN,试验结果基本一致,表明这两种测量方法可靠有效。此外,NanoMan可控制针尖推动单个颗粒在基底表面做滑移运动,表明颗粒-基底的滑动摩擦力与针尖施加载荷和扫描速度密切相关。

Measuring the friction force during the lateral manipulation of individual nanoparticle with the atomic force microscope technique is a straightforward approach to evaluate the removal of nanoparticles from the substrate.The silicon wafer was hydroxylated to enhance the hydrophilic property,and then diluted polystyrene latex was deposited on the wafer to form a dispersive single-layer.Both atomic force microscope / lateral force mode and atomic force microscope /NanoMan modes were used to push the individual particle laterally,and the maximum static friction forces were（1.57±0.09） μN and（1.51±0.13） μN,respectively.The results show that the two methods are reliable and effective.In addition,the NanoMan mode was used to push individual nanoparticle to slide along a given path.The results indicate that the sliding friction force between nanoparticles and substrate closely correlate with applied load and velocity of the tip.