蓝宝石抛光去除率试验的正交设计方法

The Orthogonal Experimentation of Sapphire Polishing Removal Rate

影响蓝宝石抛光去除率的因子有很多,为了得到最佳工艺流程和工艺参数组合,实际工作中需要在诸多影响因素中找出对去除率影响最显著的因子,并以拟合方程的形式来建立数学模型。探讨了运用正交试验的方法,通过MINITAB软件对试验数据进行分析,从而了解各抛光参数对抛光去除率的影响,最终确定一组最优的工艺参数。

There are many factors which affect the sapphire polishing removal rate,in order to find the best process parameters,in-depth and comprehensive understanding of sapphire polishing process parameters on the polishing removal rate,this paper through the orthogonal test,and by the analysis of the MINITAB software,ultimately,determine the process parameters which meet the requirements.