摘要
以晶片表面颗粒净增值为考量标准,研究了片盒清洗中清洗温度、干燥方式和活性剂对清洗工艺的影响,提出了较为理想的片盒清洗工艺条件。
In this paper,the cleaning technology of shipping box was studied from the net increasing of paticles of wafer surface.The effect of cleaning temperature,the way of dry and the surfactant on the cleaning technology were researched,and the acceptable cleaning technology was proposed.
出处
《电子工业专用设备》
2012年第4期37-39,共3页
Equipment for Electronic Products Manufacturing
关键词
颗粒净增
片盒清洗
温度
干燥
net increasing of paticles
shipping box cleaning
temperature
dry
