分散剂对超细CeO_2抛光液稳定性的影响

Effects of dispersant agents on the stability of ultrafine CeO_2 polishing slurry

通过对超细CeO2抛光液中Zeta电位及黏度的测定,研究了溶液pH值、分散剂以及分散剂用量等因素对超细CeO2抛光液分散稳定性的影响。结果表明,固相质量分数8%的CeO2抛光液,pH值为4～5,选用非离子表面活性剂异丙醇胺作为分散稳定剂,加入质量分数为0.3%～0.4%时,抛光液Zeta电位较高,溶液黏度较低,抛光液分散稳定性较好。

By determining zeta potential and viscosity in ultrafine CeO2 polishing slurry,the effects of such factors as solution pH value,dispersant agents and dosage upon the dispersion stability of ultrafine CeO2 polishing slurry are studied.Results show that for the CeO2 polishing slurry with 8% solid content having a pH value of 4～5,it′s better to select amine isopropyl alcohol（a non-ion surface active agent） as an anti-shrinking agent,and the optimal addition amount is 0.3%～0.4%（mass fraction）.In that case,the polishing slurry,with a higher zeta potential and lower viscosity,will perform good dispersion stability.