摘要
Amorphous Si waveguides with gradient refractive index cladding structure are proposed and fabricated using plasma-enhanced chemical vapor deposition method.Compared with 6 dB/cm for ridge waveguide without gradient cladding,the propagation loss of the gradient cladding waveguides is less than 1 dB/cm with both TE and TM polarizations.
Amorphous Si waveguides with gradient refractive index cladding structure are proposed and fabricated using plasma-enhanced chemical vapor deposition method.Compared with 6 dB/cm for ridge waveguide without gradient cladding,the propagation loss of the gradient cladding waveguides is less than 1 dB/cm with both TE and TM polarizations.
基金
financially supported by the startup package of Huaqiao University,China
