CVD金刚石涂层拉丝模温度场数值分析

Numerical Analysis of CVD Diamond Wire Drawing Temperature Field

衬底温度是热丝化学气相沉积(HFCVD)制备金刚石薄膜的重要参数之一,在拉丝模表面沉积CVD金刚石涂层时,均匀的衬底温度场显得尤为重要。对HFCVD系统中制备CVD金刚石涂层时拉丝模衬底温度场进行数值分析,得到了拉丝模温度场的分布和热丝参数对衬底温度场的影响规律,为CVD金刚石涂层拉丝模的制备提供重要指导。

Substrate temperature is one of the key parameters in diamond hot filament chemical vapor deposition（HFCVD）.Uniform substrate temperature field is even more important in diamond deposition on the interior surface of wire drawing.This paper carries out numerical analysis of the temperature field of wire drawing in HFCVD system and obtains the temperature distribution and the influence characteristics of the hot filament parameters on the magnitude and uniformity of substrate temperature field,which provide a guide for the fabrication of the CVD diamond wire drawing.