软X射线投影光刻原理装置的设计

Development of elementary arrangement for soft X-ray projection lithography

首先介绍了投影光刻技术发展的历程、趋势和软 X射线投影光刻技术的特性 ,其次介绍了软 X射线投影光刻原理装置的研制工作。该装置由激光等离子体光源、掠入射椭球聚光镜、透射掩模、镀有多层膜的 Schwarzchild微缩投影物镜、涂有光刻胶的硅片及相应的真空系统组成。 0 .1倍的 Schwarzchild微缩投影物镜具有小于 0 .

The prototype for soft X\|ray projection lithography at 13nm wavelength is introduced. It includes a laser plasma source, an ellipsoidal condenser, a transmission mask, the Schwarzschild objective, a wafer and the associated vacuum apparatus. The optical design is optimized to achieve smaller resolution than 0.2μm over a 0.1mm diameter image field of view.