摘要
首先介绍了投影光刻技术发展的历程、趋势和软 X射线投影光刻技术的特性 ,其次介绍了软 X射线投影光刻原理装置的研制工作。该装置由激光等离子体光源、掠入射椭球聚光镜、透射掩模、镀有多层膜的 Schwarzchild微缩投影物镜、涂有光刻胶的硅片及相应的真空系统组成。 0 .1倍的 Schwarzchild微缩投影物镜具有小于 0 .
The prototype for soft X\|ray projection lithography at 13nm wavelength is introduced. It includes a laser plasma source, an ellipsoidal condenser, a transmission mask, the Schwarzschild objective, a wafer and the associated vacuum apparatus. The optical design is optimized to achieve smaller resolution than 0.2μm over a 0.1mm diameter image field of view.
出处
《光学精密工程》
EI
CAS
CSCD
2000年第1期66-70,共5页
Optics and Precision Engineering
基金
国家自然科学基金!批准号 :6962 5710
关键词
软X射线投影
光刻
多层膜反射镜
soft X ray projection lithography
multilayer reflector
laser plasma source
elementary arrangement for soft X ray projection lithography