自持铝薄膜的工艺和特性研究

Technology and performance of thin self-supporting aluminium film

铝薄膜在像管中起重要作用。为了提高像管的性能 ,需要对自持铝薄膜的特性加以研究。利用静电贴膜技术制备了自持铝薄膜 ,测量了 5 0nm厚自持铝薄膜入射面的背散射系数和二次发射系数以及出射面的一次电子透射系数和二次发射系数。对于高能一次入射电子 ,自持铝薄膜的背散射系数很小 ,透射系数很大 ,二次发射系数较小。自持铝薄膜在本质上不影响像管的MTF 。

A thin aluminium film plays an important role in an image tube. In order to improve the performances of an image tube, it is needed to study the performances of thin self supporting aluminium films. Based on electrostatic film posting technology, a thin self supporting aluminium film is fabricated for the first time. Measurements have been made of the backscattering coefficient and secondary electron yield on the electron incident surface, the transmission coefficient and secondary electron yield on the exit surface of a 50nm thick self supporting aluminium film. For high energies of the incident electrons,the backscattering coefficient of a thin self supporting aluminium film is very small, the transmission coefficient is very big and the secondary electron yield is less. A thin self supporting aluminium film has no effect upon the modulation transfer function of an image tube essentially, whose secondary electrons at the exit surface heighten the brightness of an image tube.