等离子体旋转自耗电极端部熔池中的流场分析

ANAlYSIS ON FLUID FIELD IN THE END OF PLASMA-ROTANG ELECTRODE

运用Ｎｅｗｔｏｎ流体力学的微元法分析，通过对等离子体旋自旋自耗电极（ＰＲＥＰ）端部小熔池中液膜流动的稳态层流假设，建立了液膜中流体运动的微分方程．并运用相关边界条件，得到了该微分方程的解析解，由此得到液膜厚度的表达式．该式表明液膜厚度与等离子体电弧功率、ＰＲＥＰ直径及旋转速度存在依赖关系．通过改变这些工艺参数，进行了实验验证，结果表明，实测的液膜厚度同理论计算值符合较好。

With the application of the differential method of Newton fluid dynamics and under the hypothesis of the steady laminar flow in the small furnace on the end of PREP, differential equations of the fluid motion in the liquid film were established. Combined with the relative boundary conditions, the analytical solutions were presented. By the use of such analytical solutions, the description equation of the liquid film thickness was formulated. It reflects that liquid film thickness depends on the power of plasma electric arcs the diameter and the rotating velocity of the rotation self-consuming electrode. The results have been verified by adjusting these parameters.