反应磁控溅射直接生长绒面结构ZnO：Al-TCO薄膜及其特性研究

Preparation and characteristics of natively textured surface ZnO:Al-TCO thin films grown via magnetron sputtering

利用反应磁控溅射技术,在玻璃衬底上直接生长获得了"弹坑状"绒面结构的ZnO:Al-TCO薄膜。通过梯度O2生长(GOG,gradual oxygen growth)方法改善ZnO薄膜的透过率和绒度特性,并且具有较好的电学性能。通过优化实验,GOG方法生长ZnO:Al薄膜(薄膜结构:11.0sccm/10R+9.5sccm/15R)的"弹坑状"特征尺寸为300～500nm,可见光范围透过率达到90%,方块电阻约为4.0Ω/□,电子迁移率为17.4cm2/V-1.s-1。大面积镀制的ZnO:Al具有良好的绒面结构和电学均匀性,可应用于光伏(PV)产业化推广应用。

Natively textured surface Al-doped ZnO（ZnO：Al） thin films with crater-like structure were directly deposited via reactive magnetron sputtering.The optical transmittance and haze performance of ZnO：Al thin films with low sheet resistances are improved through（GOG,gradual oxygen growth） method.The crater-like feature sizes of ZnO：Al thin films（structure：11.0 sccm/10R＋9.5 sccm/15R） with gradual oxygen growth are ~300-500 nm.Typical optical and electrical characteristics of ZnO：Al thin films are：transmittance in visible region is ~90%,sheet resistance is ~4.0 Ω and electron mobility is ~17.4 cm2/Vs.Large-area（S=110 mm×240 mm） ZnO：Al thin film exhibits milky surface and good electrical uniformity.Natively textured surface ZnO：Al thin films are promising TCO materials for PV industry.