氮化硅薄膜制备技术及工艺参数调整

Prepared Technique of Silicon Nitride Film and Adjustment of Process Parameters

氮化硅薄膜的制备过程是太阳能电池制造中的一个核心环节,我公司使用的Centrotherm厂家的管式PECVD设备及R&R厂家的链式PECVD设备更是代表了两种最先进的氮化硅薄膜制备技术,本文简要介绍了SiNx薄膜的特性、制备的技术特点及工艺参数的调整等相关知识。

The preparation of the silicon nitride film is a core part of solar cell manufacturing.The tube PECVD equipment of Centrotherm manufacturer and chain PECVD equipment of R R manufacturer used in Yingli Green Energy Holding Company Limited represent the two kinds of most advanced preparation technique of silicon nitride film.This paper briefly describes the characteristics of SiNx film,the technical characteristics of preparation as well as the adjustment of process parameters.