工艺参数对磁控溅射ZrN膜耐腐蚀性能的影响

Effect of Vacuum Magnetron Sputtering Parameters on Corrosion Resistance of Zirconium Nitride Films

为寻求真空磁控溅射ZrN膜耐蚀性与其溅射工艺间的规律,在1Cr18Ni9Ti不锈钢表面以不同的工艺参数真空磁控溅射了系列ZrN膜。通过中性盐雾试验确定了不同工艺参数所得ZrN膜的耐蚀性等级。结果表明:ZrN膜耐蚀性随N2流量的增加先增加,但超过15 mL/min后,膜的耐蚀性反而下降;ZrN膜耐蚀性随反应温度升高而增强;ZrN膜的耐蚀性随反应时间的增加越来越好,但超过15 min后,膜的耐蚀性不再增强;以ZrN膜的耐蚀性为依据,最佳溅射工艺参数为N2流量15 mL/min,反应时间15 min,反应温度200℃。

A series of ZrN films were prepared on the surface of 1Cr18Ni9Ti stainless steel by vacuum magnetron sputtering at different parameters.The corrosion resistance grade of as-prepared magnetron sputtered ZrN films was estimated by conducting neutral salt-spray tests.It was found that the corrosion resistance of as-prepared ZrN films increased with increasing flow rate of N2,but it tended to decline when the flow rate of N2 was above 15 mL/min.In the meantime,the corrosion resistance of ZrN films rose with increasing reaction temperature and increasing reaction time,but it tended to stabilize when the reaction time was above 15 min.The optimized magnetron sputtering parameters were suggested as N2 flow rate of 15 mL/min,reaction time of 15 min and reaction temperature of 200 ℃.