期刊文献+

HEMT器件力电耦合传感特性测试

Test on electromechanical coupling sensitive property of HEMT device
下载PDF
导出
摘要 设计了在Si微结构与AlGaN/GaN高电子迁移率晶体管(HEMT)集成的微机电系统(MEMS)。通过微机械加工工艺,完成了力电耦合传感结构的加工。通过实验测试发现HEMT器件具备很强的力电耦合特性,测试结果在-1.5 V栅压下,HEMT器件对应力的灵敏度为123.96 MPa/mA,线性度为6.95%。 A MEMS integrates Si micro-structure with AlGaN/GaN high-electron-mobility transistor(HEMT)devices is designed.Fabrication of the electromechanical coupling sensitive structure is achieved.The experimental test indicates that the AlGaN/GaN HEMT device has strong electromechanical coupling effect.When grid voltage is-1.5V,the value of sensitivity is up to 123.96 MPa/mA and the value of linearity is 6.95 %.
出处 《传感器与微系统》 CSCD 北大核心 2012年第5期145-146,152,共3页 Transducer and Microsystem Technologies
基金 国家自然科学基金资助项目(50730009) 电子测试国家重点实验室基金资助项目(9140C1204030907)
关键词 AlGaN/GaN/Si 高电子迁移率晶体管 力电耦合效应 灵敏度 AlGaN/GaN/Si HEMT electromechanical coupling effect sensitivity
  • 相关文献

参考文献8

  • 1Pearton S J, Kang B S, Kim S, et al. GaN-based diodes and transistors for chemical, gas, biological and pressure sensing [ J ]. Journal of Physics : Condensed Matter,2004,16:961 -994.
  • 2Eickhoff M, Schalwig J, Steinhoff G, et al. Electronics and sensors based pyroelectric A1GaN/GaN heterostructures[ J]. Part B:Sensot Applicatiorts ,Physics Status Solid C ,2003,6:1908 - 1918.
  • 3Davies S, Huang T S, Gass M H, et al. Fabrication of GaN canti- levers on silicon substrates for microelectromechanical device- s[ J]. Apply Physics Letters,2004,14:2566 -2568.
  • 4Bykhovski A D, Kaminski V V, Shur M S, et al. Piezoresistive effect in wurtzite n-type GaN [ J ]. Apply Physics Letters, 1996, 68:818 -819.
  • 5Han A, Wang Y, Wang H. Low temperature-dependence mobilityof transistor[ J]. Researchment and Exploitation of Solid-electronics, 1993,13 : 123 -128.
  • 6Bouguen L, Konczewicz L, Contreras S, et al. High temperature behaviour of AlGaN/AlN/GaN Hall-FET sensors [ J ]. Materials Science and Engineering B ,2009,165 : 1 -4.
  • 7Jha S, Jelenkovic E V, Pejovic M M, et all. Stability of submicron AlGaN/GaN HEFT devices irradiated by gamma rays [ J ]. Microelectronic Engineering,2009,86:37 -40.
  • 8Liang T, Tang J, Xiong J, et al. Synthesis and characterization of heteroepitaxial GaN films on Si ( 111 ) [ J]. Vacuum, 2010,84 : 1154 -1158.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部