磁控溅射温度与时间对ZrN薄膜附着力的影响

Effect of magnetron sputtering temperature and time on adhesion of ZrN films

采用非平衡磁控溅射技术在1Cr18Ni9Ti不锈钢上制备了ZrN薄膜。用SEM、EDS观察并分析了薄膜的表面形貌和成分,用光电轮廓仪测量了膜层厚度。并采用划格法测试不同溅射时间和温度制备的薄膜附着力大小。分析不同溅射时间和温度对薄膜附着力的影响规律。结果表明,通过调节磁控溅射时间和温度可以得到具有一定厚度,成分稳定,结构致密的ZrN薄膜,且溅射时间在1～20 min范围内时间越长薄膜附着力越大,溅射时间超过20 min,附着力趋于稳定;溅射温度在30～90℃范围内温度越高薄膜附着力越大,超过90℃溅射温度继续升高附着力减小。

ZrN films were prepared on 1Cr18Ni9Ti stainless steel by using unbalanced magnetron sputtering technique.Surface morphology and composition of the films were observed and analyzed by means of SEM and EDS.Thickness of the films was measured by optoelectronic profilometer.Adhesion of the films prepared by different sputtering time and temperature was examined by scratching grid method.The results show that the ZrN film with certain thickness,stable composition and compact structure is obtained by adjusting the sputtering time and temperature.The adhesion of the films is enhanced as sputtering time increases from 1 min to 20 min,and the adhuesion tends to stabilization when sputtering time over 20 min.The adhesion of the ZrN films increases with increasing sputtering temperature from 30 ℃ to 90 ℃ and then decreases when the temperature exceeds 90 ℃.