摘要
采用辉光放电质谱法(GD-MS)对高纯铌中Ta,Mo,W等痕量杂质元素进行了测试,并对GD-MS工作参数进行了优化,部分元素与采用电感耦合等离子体质谱法(ICP-MS)定量分析的结果进行比较,对某些元素含量差别较大的原因进行了分析,论述了Element GD辉光放电质谱仪的特点及其在痕量杂质分析上的优势。
Elements such as Ta,Mo,W in high-purity niobium were determined by glow discharge mass spectrometry（GD-MS）.The operating parameters and conditions of GD-MS were optimized and selected.Results of a partion of elements determined by GD-MS were compared with those analyzed by inductive coupled plasma mass spectrometry（ICP-MS）.The characteristics and advantages of trace element analysis by element GD-MS were discussed.
出处
《分析试验室》
CAS
CSCD
北大核心
2012年第6期39-42,共4页
Chinese Journal of Analysis Laboratory
基金
国家科技支撑计划项目(2006BAF07B02)资助
