扫描定点法在Si/Mo多层膜材料深度剖面分析中的应用

Application of RAS-POINT MODE in the Depth Profile of Si/Mo Multilayer Film Material

:用对比方式对分割成二等分的同一Si/Mo多层非晶薄膜样品分别作了RAS POINTMODE和POINTMODE的二次离子质谱深度剖面分析 ,前者是把RASMODE(扫描法 )与POINTMODE(定点法 )有效结合起来的一种方法 ,即所谓扫描 -定点法。实验证明 ,扫描 -定点法有效地克服了弹坑效应 (Cratereffects)。

A Si/Mo noncrystalline multilayer film sample was cut into two equal pieces in surface area for two times SIMS depth profile analysis by using RAS POINT MODE and POINT MODE respectively. The results obtained by RAS POINT MODE,which is a kind of RAS MODE in combination with POINT MODE, form a striking contrast to POINT MODE and show that RAS POINT MODE overcome the “Crater effects”efficiently.