紫外激光与半导体相互作用研究进展综述

Research Progress of Ultraviolet Laser Interaction with Semiconductors

紫外激光与半导体相互作用是当今国内外研究的热点。综述了紫外激光与半导体相互作用在光电子产业、激光加工、激光表面改性等方面的应用。介绍了紫外激光与半导体相互作用的基本原理,总结了紫外激光烧蚀半导体的理论模型,包括热传导模型、载流子耦合扩散模型、光化学模型、表面热蒸发模型、双温模型、表面充电模型等。总结了关于损伤形貌、烧蚀阈值和紫外激光损伤半导体机理的实验研究。提出了紫外激光与半导体相互作用可能的研究和新的应用方向。

The ultraviolet（UV） laser interaction with semiconductors has a considerable interest in recent years.The applications of UV laser interaction with semiconductors are reviewed,including photon-electron in dustry,laser machining and laser surface modification.The theory of UV laser interaction with semiconductors is introduced,and the theory model of UV laser ablation on the semiconductor is summarized,including heat con duction model,carrier coupling diffusion model,photochemical model,thermal surface vaporization model,dou ble-temperature model and laser induced surface charging model.The experimental results of damage morpholo gy,ablation threshold and mechanisms of semiconductor damaged by UV laser ablation are summarized.The pro posals of possible research and new application field of UV laser interaction with semiconductors are presented.