摘要
利用双光束干涉,在光敏材料上制作光子晶体结构.通过改变两束光之间的夹角可以改变制备样品的周期.改变曝光次数以及两次曝光时干涉条纹的夹角可以分别得到一维、二维正方晶格以及二维三角晶格结构的光子晶体.
The fabricate photonic crystal on photosensitive material is proposed by double-beam interference.The period of the structure can be controlled by changing the angle between two beams.The one-dimensional grating structure and two-dimensional photonic crystals with square lattice and triangular lattice should be obtained by changing the time of exposure and the angle between the interference fringe of two exposures.
出处
《大学物理》
北大核心
2012年第5期54-57,共4页
College Physics
关键词
双光束干涉
干涉光刻
光子晶体制作
double-beam interference
interference lithography
fabrication of photonic crystal
