摘要
通过双层辉光离子渗表面处理技术,在纯Ti基体上制备了非晶/纳米晶TiB2及Ti(Al)B2薄膜。利用X射线衍射(XRD)和透射电子显微镜(TEM)观察薄膜的微观组织特征。运用动电位极化及交流阻抗谱(EIS)的电化学方法,研究薄膜试样在3.5 wt.%NaCl溶液中的电化学特性。结果表明:制备的薄膜试样大大提高了纯Ti基体耐蚀性能,Al元素的加入稍微降低了薄膜的耐蚀性,但仍优于基体材料。
The amorphous-nanocrystalline TiB2 and Ti（Al）B2 films were prepared on pure Ti substrate by double glow discharge plasma technique.The microstructures of films were studied by X-ray diffractrometry and transmission electron microscopy（TEM）.The corrosion behaviour of films had been characterised by potentiodynamic polarization and electrochemical impedance spectroscopy（EIS）in 3.5 wt.% NaCl solution.The results revealed that the corrosion resistance of the amorphous-nanocrystalline TiB2 films was improved.Corrosion resistance of film can be decreased by adding Al element,but still better than the substrate.
出处
《电子器件》
CAS
北大核心
2012年第2期135-138,共4页
Chinese Journal of Electron Devices
基金
江苏省自然基金项目(BK2010073)
关键词
非晶/纳米晶
耐蚀性能
动电位极化
交流阻抗谱
amorphous-nanocrystalline
corrosion resistance
potentiodynamic polarization
EIS
