等离子体基离子注入过程中试样温度的预测

Prediction of sample temperature during plasma-based ion implantation

建立了等离子体基离子注入过程中试样温度预测的理论模型 ,应用这个模型进行了一系列数学模拟 .以纯铝为例测定了在不同的注入条件下试样的温度变化 ,得到的实验结果与数学模拟相符合 .试验表明 ,低功率注入时 ,系统达到热平衡的时间较长 ,而且热平衡温度低 ;随功率的上升 ,试样升温加快 ;注入功率密度高时 ,试样容易在注入过程中达到平衡温度 ,而且其平衡温度受注入功率的影响较小 ;试样的尺寸也是影响试样温度平衡的一个主要因素 .

A theoretic model for prediction of sample temperature during plasma based ion implantation was established, and computer simulation was done with the model. The temperature of pure aluminum sample under different conditions was also measured. The measured value was in good agreement with the calculated value. The result revealed that, when ion implantation occurs at lower power, the time required to achieve the balance temperature is longer. With the increase of power, the increase of temperature is larger. It is easy to achieve the balance temperature for a sample with higher power density, and the power has little effect on the balance temperature. In addition, the size of sample is an important factor on temperature balance.