摘要
电子束曝光技术是近三十年来发展起来的一门技术 ,主要应用于 0 .1～ 0 .5μm的超微细加工 ,甚至可以实现纳米线条的曝光。文中重点介绍电子束曝光系统、电子束抗蚀剂以及电子束曝光技术的应用。
Electron beam(EB)lithography is a technique developed in the last thirty years.It is mainly employed to deep micrometer direct writing with line width down to 0.5 μm.Moreover,it can also be used in nano level lithography.The EB lithography system is described.Photoresist for electron beam lithography is introduced.And finally,applications of the technology are discussed in particular.
出处
《微电子学》
CAS
CSCD
北大核心
2000年第2期117-120,共4页
Microelectronics
关键词
电子束曝光
微细加工
抗蚀剂
Electron beam lithography
Micromachining
Photoresist
