卷对卷纳米压印脱模过程的有限元模拟

Finite element analysis on the demolding process of the micro-patterns in roll-to-roll nanoimprint lithography

本文提出卷对卷纳米压印脱模的两种形式并分析了脱模过程中的阻力。选取垂直于光栅形微结构的截面作为研究对象,忽略脱模过程中旋转角度的影响,将模板上微结构当作竖直平移脱离胶层的方式来处理,利用ANSYS有限元软件模拟了卷对卷脱模过程中不同位置的变形和等效应力分布。结果显示脱模过程中出现两处应力集中,且应力集中处的最大应力在脱模刚发生时出现波动,随后逐渐增大。

In this paper, two demolding types are demonstrated for roll-to-roll nanoimprint lithography （R2RNIL）, and the demolding force model is presented. During the demolding process, the mold motion could be regarded as a parallel separation from the imprinted structure with the rotation influence neglected. The deformation and distribution of the equivalent stress at different positions are analysed using the finite element method. The results show that the stress concentration occurs at two places in the imprinted structure, and the maximum stress fluctuates at the beginning of demolding, then it becomes higher with the demolding process.