退火处理对TiO_2薄膜结构和透射的影响

Influence of annealing on the microstructure and transmittance of TiO_2 thin films

在常温下,采用射频反应磁控溅射方法在不同溅射功率下于K9双面抛光玻璃基底上制备二氧化钛薄膜。将制备的样品进行450℃退火6 h热处理。利用X射线衍射仪(XRD)对比分析了退火前后薄膜的微观结构,采用光栅光谱仪测试了退火前后薄膜样品的透射谱。实验结果表明,退火前薄膜样品是非晶态,退火后薄膜晶化为晶态,但不同溅射功率下制备的薄膜结晶取向有差异;退火热处理对薄膜的折射率有一定影响,表现为退火前后透射谱偏移。

TiO2 thin films were deposited on polished K9 glass substrates by RF reactive magnetron sputtering under various sputtering powers at room temperature.The as-deposited films were then annealed at 450℃ for 6 hours.X-ray diffraction(XRD) and grating spectrometer were used to analyze the crystalline structure and transmittance spectra for the as-deposited and annealed films,respectively.The results show that all the as-deposited films are amorphous and they become crystalline after the annealing,except that the preferred orientation varies with sputtering power.A little bit shift of the transmittance spectra indicates that the annealing has some effects on the refractive indices of the films.