摘要
对杯状纵磁真空灭弧室的三维静磁场、三维交变磁场及触头片中的涡流分布进行了有限元计算和分析。计算结果表明，交变磁场的分布与静磁场的分布有所不同，这主要是由涡流引起的。涡流的影响在触头中心处最大，在槽口之间次之，在槽口上方影响最小。
In this paper, the AMF of the VI is calculated by finite element method software, which include 3D DC AMF and 3D AC AMF in the gap. The induced eddy current in the contacts is also analyzed. The results show that AC AMF is different from that of the DC AMF because eddy current exists. The eddy current influences the AMF distribution in the center of contact most heavily, between the slots lightly, and on the slots most lightly.
出处
《高压电器》
CAS
CSCD
北大核心
2000年第2期18-21,共4页
High Voltage Apparatus
关键词
真空灭弧室
纵向磁场
vacuum interrupter (VI)
axial magnetic field (AMF)
