磁控反应溅射TaN薄膜的结构和性能

The Structures and Properties of the TaN Coatings Deposited by the Reaction Magnetron Sputtering

采用磁控溅射仪制备了TaN薄膜 ,研究了不同氮分压条件下TaN薄膜的成份、结构和力学性能。结果表明 ,氮分压在 0 .2× 10 -1Pa时镀层由两相混合物正方结构的 β -Ta和面心立方结构的δ -TaN组成。而氮分压在 0 .4× 10 -1～ 0 .8×10 -1Pa时 ,得到单相六方TaN结构。随着氮分压的增加硬度呈下降趋势 ,在氮分压为 0 .2× 10 -1Pa时出现最高硬度 ,分析认为这与薄膜中存在的两相组织和高的压应力有关。

In this paper the compositions,microstructures and properties of the TaN thin films at different nitrogen pressures have been investigated by using magnetron sputtering technique.The results showed that the coatings were composed of a mixtures of β-Ta and δ-TaN at a nitrogen pressure of 0.2×10 -1 Pa.Whereas coatings deposited at 0.4×10 -1 ～0.8×10 -1 Pa nitrogen pressures had a single-phase hexagonal TaN structure.The microhardness values decreased with the increase of nitrogen pressure.The hardness values reached a maximum at a nitrogen pressure of 0.2×10 -1 Pa,which were related to the two phase structures and high compress stress of the coatings.