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成像区外异常体对电阻率层析成像结果的影响

THE INFLUENCE OF THE SURROUNDING RESISTIVITY STRUCTURES ON RESISTIVITY TOMOGRAPHY
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摘要 作者研究了成像区外不均匀体对电阻率层析成像结果的影响 ,其结果表明 :成像区外非均匀体的存在对成像结果的影响是明显的 ;在用地面和钻孔中采集的数据成像时这种影响表现为产生一个相对于钻孔呈大致对称关系的假像 ;这种影响随着区外非均匀体远离成像区而减小 ;当区外非均匀体与距其较近的一口井的距离大于井间距的一半时 ,这种影响即可忽略。 The influence of the surrounding resistivity structures on Resistivity Tomography(RT) is studied with numerical modeling method in this paper.The research results show that this kind of influence is remarkable. When the images are made with data got from two wells and the ground, they will conduct false images of anomalies which are out of the exploration area, and these false images are about symmetrical with respect to the near well, reduce as the distance between surrounding anomalies and the near wells increases; and it will be negligible if the distance is more than half of the well spacing between two wells.
出处 《物探化探计算技术》 CAS CSCD 2000年第1期18-20,72,共4页 Computing Techniques For Geophysical and Geochemical Exploration
基金 中国有色地质总局科研项目 !(编号 :98-D-6) 云南省自然科学基金项目!(编号 :98D0 77M) 云南省青年地震科学基金联合资助
关键词 成像区外异常体 电阻率 层析成像 成像结果 surrounding anomalies resistivity tomography influence on RT
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